This set of books provide a detailed introduction to molecular beam epitaxy (MBE) of Oxides and modern characterization techniques used to analyze thin oxide films. A reprint volume containing seminal papers in the filed allows the reader to experience the excitement of discovery first hand in the voices of people who made those discoveries. MBE revolutionized the semiconductor technology, but its introduction to oxide growth has been delayed, owing to a complex set of reasons that range from practical difficulties (chemically aggressive environment and high temperature) to fundamental differences from semiconductors (reactive growth). It aims to be a useful reference to an expert as well as a guide to a graduate student.
Contents:- X-ray Scattering-based Methods (Steve May)
- Ion Beam Analytical Techniques (Kin Man Yu)
- Scanning Transmission Electron Microscopy (Steven Spurgeon)
- X-ray Photoelectron Spectroscopy (Scott Chambers)
- Angle-Resolved Photoelectron Spectroscopy (Kyle Shen and Jason Kawasaki)
- Spectroscopic Ellipsometry (Tiffany Kaspar and Stefan Zollner)
- Scanning Probe Microscopy (Giada Franceschi, Michele Riva, Michael Schmid and Ulrike Diebold)
- X-ray Absorption Spectroscopy (Andreas Ney and Verena Ney)
- Extended X-ray Absorption Spectroscopy Fine Structure (Steve Heald and George Sterbinsky)
