GENERATION AND APPLICATION OF HIGH DENSITY LOW-FREQUENCY INDUCTIVELY COUPLED PLASMAS

This talk focus on the generation and application of steady-state, high density plasmas in two forms of low-frequency inductively coupled plasma (LF ICP) sources, namely a conventional ICP with external flat coil configuration and an internal planar unidirectional RF current driven through a specially designed internal antenna configuration. The underlying physics, results of the experimental investigation and applications of both types of LF ICP sources are discussed. The main properties of the LF ICP processed materials can be efficiently controlled by the plasma parameters and discharge operating regimes. The examples include fabrication of crystalline thin-film photovoltaic solar cells, assembly of ordered nanostructures and growth of uniform quantum dots and superlattices.

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