SONO-ELECTROLESS PLATING OF Ni-Mo-P FILM

Sonication is powerful agitation. Deposited films and electrochemical kinetics parameters were affected. The effects of micro-jet on the deposition rate and shock wave pressure on the smooth of deposited film had been studied. The bath was 0.095 mol/dm³ NiSO₄6H₂O, 0.005 mol/dm³ Na₂MoO₄, 0.3 mol/dm³ NaH₂PO₂, 0.06 mol/dm³ Na₃C₆H₅O₇2H₂O, and pH 8.5. The temperature was 353 ± 3 K. The plating rate in sonication had a little faster compared with that in stationary state with micro-jet effects. The thickness of plated film was affected with bath temperature and bath composite. When the concentration ratio of Ni and Mo increased and ratio of Mo was decreased, thickness was thicker. The plated film was an amorphous. Plating rate was faster with micro-jet. The surface was smoothed with shock wave pressures.