PREPARATION AND CHARACTERIZATION OF Zr-DOPED TiN NANOFILM

The Zr-doped TiN coating, a nanometer (Ti, Zr)N thin film, has been deposited by reactive magnetron sputtering on slides and Al substrates. The crystalline phase and energy band structure have been analyzed by XRD and STS. The results of XRD show that the (Ti, Zr)N film is poly crystalline and consisted of mixed crystal of TiN and ZrN phase. The STS spectra show that Zr-doping didn't change the position and band-gap of energy level, only two new energy levels appeared, E_g = 0.33eV and E_g = 0.42eV. According to the results of measurement, (Ti, Zr)N has higher hardness and better corrosion resistance than TiN by Zr-doping.