SIMPLE AND COST EFFECTIVE FABRICATION OF ZnO THIN FILMS ON HYDROGEN TERMINATED SILICON SUBSTRATES BY NEBULISED SPRAY PYROLYSIS
Abstract
Pure and Al doped nanocrystalline ZnO films have been prepared on Hydrogen terminated Si(100) substrates by nebulized spray pyrolysis. The dependence of the structural, compositional and electrical properties were investigated using XRD, EDX, AFM and spectrophotometer. The X-ray diffraction data coincide well with the pattern of ZnO reported with the Standard Database. Films annealed at higher temperatures show better orientation, as revealed from X-ray diffraction patterns. Annealing the films in air improved the electrical properties. From the I-V characteristics, the nonlinear coefficient α value has been estimated. Reflectance measurements show good reflectance in the IR region for pure ZnO films, and Al doping improved the reflectance values.
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