HIGH EFFICIENCY MICROMACHINING SYSTEM APPLIED IN NANOLITHOGRAPHY

Scanning probe lithography such as direct–writing lithographic processes and nanoscratching techniques based on scanning probe microscopy have presented new micromachining methods for microelectromechanical system (MEMS). In this paper, a micromachining system for thermal scanning probe lithography is introduced, which consists of the cantilever arrays and a big stroke micro XY–stage. A large machining area and high machining speed can be realized by combining arrays of cantilevers possessing sharp tips at their top with the novel micro XY–stage which can obtain big displacements under relatively low driving voltage and in a small size. According to the above configuration, this micromachining system is provided with high throughputs and suitable for industrialization due to its MEMS–based simple fabrication process. The novel micro XY–stage applied in this system is presented in detail including the unique structure and principles, which shows an obvious improvement and distinct advantages in comparison with traditional structures. It is analyzed by mathematical model and then simulated using finite element method (FEM), it is proved to be able to practically serve the micromachining system with high capability.