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ArticlesNo Access

EFFECTS OF TECHNICAL PARAMETERS ON THE PULSED LASER DEPOSITED FERROELECTRIC FILMS

School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China

Shandong Architecture University, Ji'nan 250014, P. R. China

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CHUANZHONG CHEN

School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China

Corresponding author.

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School of Mechanical Engineering, Shandong University, Ji'nan 250061, P. R. China

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School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China

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School of Materials Science and Engineering, Shandong University, Ji'nan 250061, P. R. China

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https://doi.org/10.1142/S0218625X06008669Cited by:0 (Source: Crossref)

Abstract

Pulsed laser deposition (PLD), which is a novel technique in producing thin films in the recent years, shows unique advantages for the deposition of ferroelectric films. Effects of technical parameters on the pulsed laser deposited ferroelectric films, including substrate temperature, oxygen pressure, post-annealing, buffer layer, target composition, energy density, wavelength, target-to-substrate distance, and laser pulse rate, are systematically reviewed in order to optimize these parameters. Processing-microstructure-property relationships of ferroelectric films by PLD are discussed. The application prospect is pointed as well.

Keywords:

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Vol. 13, No. 05

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Received 24 March 2006

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