Fabrication of Anti-Reflective Film for Solar Cells through Hot Embossing Process Using Laser-Patterned Mold: Parametric Analysis and Optimization

This research reports the development of anti-reflective films for solar cell application by employing the hot embossing technique with laser-patterned microstructures. The goal is to increase the light-trapping ability of crystalline silicon (c-Si) wafers by employing micro-textured polycarbonate films to decrease surface reflectance. A series of micron-sized rhombus patterns were first created on the titanium-grade-5 mold using a fiber laser, and then, polycarbonate sheets were hot embossed under the optimized conditions. In order to investigate the influence of the embossing temperature, pressure, and time on the average reflectance and surface roughness of the films, a parametric analysis was carried out through the Taguchi method. The most effective embossing parameters were the embossing temperature of $220^{\circ }$C, pressure of 50 kg/cm², and an 8 min embossing duration, which resulted in a significant decrease of 41.53% reflectivity. The findings in the existing study and a fuzzy logic-based multi-objective optimization approach also supported these findings, suggesting the scalability and efficiency of the process. It is evident that the proposed method could provide a more significant cost reduction in fabricating anti-reflective films with large-area applications to optoelectronics devices such as solar cells, LEDs, and optical sensors. This study opens the door to further studies about using micro-patterned films to enhance light management for other energy-efficient devices.