ION IMPLANTATION: A NON-EQUILIBRIUM PROCESS

The following sections are included:

• Introduction

• Basic Processes

  • Ion penetration and channeling

  • Ion Damage

  • Sputtering

  • Atomic Mixing

• Selected Examples of Non-equilibrium Behaviour

  • Low Temperature Oxidation and Segregation

  • SupersaturatedSolid Solutions

  • Defects and Defect-mediated Processes in Silicon

  • Cavities and Metal Accumulation in Silicon

• Amorphous Silicon: An Ideal Metastable System

  • Some Thermodynamic Properties

  • Crystallisation Kinetics of Amorphous Silicon

  • Solubility and Diffusion ln Amorphous Silicon

• Conclusions

• References