Wet and Dry Etching of III-V Semiconductors

The following sections are included:

• Introduction

• Wet Etching

• Dry Etching

• Gas Chemistries

  • BC1₃

  • Iodide Based Chemistries

  • Bromine Chemistries

  • Cl₂/CH₄/H₂; CH₄/H₂

  • Selective Etching of InGaAs and InP Over AlInAs

  • Changes in Electrical and Structural Properties of Etched Surfaces

  • Effects of Temperature and Microwave Power

• Specific Processes

  • HBT Processing

  • HEMT Etching

  • Long Wavelength Laser Etching

  • Microdisk Laser Etching

  • Via Hole Etching

  • Etching W and Related Alloys

  • Etching Resist or Polymers

  • III-V Nitrides

  • Plasma Cleaning

• Conclusions

• References