CONTROLLED CONTINUOUS VARIATION OF THE MAGNETIC ANISOTROPY IN CoP MULTILAYERS ELECTRODEPOSITED OVER SPUTTERED COPPER THIN FILMS

CoP amorphous multilayers, with thicknesses between 0.4 μm and 4 μm, have been electrolytically grown over sputtered copper thin films, exhibiting in-plane magnetic anisotropy. Depositing samples with different thicknesses, we observe a continuous variation in the easy direction for the magnetization, from the transversal direction to intermediate and to the longitudinal one. Therefore, controlling the parameters of the deposition, it is possible concomitantly modify the anisotropy direction, without any further treatment, and consequently, to control the magnetization processes of these samples.