An Etching Yield Parameters Optimization Method Based on Ordinal Optimization and Tabu Search Hybrid Algorithm

In this paper, we propose a method to optimize etching yield parameters. By means of defining a fitness function between the actual etching profile and the simulation profile, the etching yield parameters solving problem is transformed into an optimization problem. The problem is nonlinear and high dimensional, and each simulation is computationally expensive. To solve this problem, we need to search a better solution in a multidimensional space. Ordinal optimization and tabu search hybrid algorithm is introduced to solve this complex problem. This method ensures getting good enough solution in an acceptable time. The experimental results illustrate that simulation profile obtained by this method is very similar with the actual etching profile in surface topography. It also proves that our proposed method has feasibility and validity.