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Research PapersNo Access

NANOSTRUCTURE OF TiO₂ THIN FILMS PREPARED BY UNBALANCED MAGNETRON SPUTTERING

ARTORN POKAIPISIT

Optics and Laser Laboratory, Thailand Center of Excellence in Physics, CHE, 328 Si Ayutthaya Rd., Bangkok 10400, Thailand

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,

SURASING CHAIYAKUN

Department of Physics, Faculty of Science, King Mongkut's University of Technology Thonburi, Bangkok 10140, Thailand

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,

PICHET LIMSUWAN

Department of Physics, Faculty of Science, King Mongkut's University of Technology Thonburi, Bangkok 10140, Thailand

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, and

BOONLAER NGOTAWORNCHAI

Scientific and Technological Research Equipment Centre, Chulalongkorn University, Bangkok 10330, Thailand

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https://doi.org/10.1142/S0217979209052297Cited by:0 (Source: Crossref)

Abstract

In this study, titanium dioxide (TiO₂) thin films were deposited on unheated glass substrates using an unbalanced magnetron sputtering system with different deposition times of 25, 35 and 45 min, respectively. The structure and surface morphology of TiO₂ thin films were characterized by atomic force microscopy (AFM) and transmission electron microscopy (TEM) with selected-area electron diffraction (SAED). It was found that the crystallite size of TiO₂ thin films was in the range of 10–20 nm, and the surface roughness was 1–3 nm. The SAED patterns show that the phase of TiO₂ thin films obtained in this study is anatase phase.

Keywords:

PACS: 68.37.Ps, 68.37.Og, 68.47.Gh, 81.15.Cd

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Vol. 23, No. 10

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Received 5 August 2008

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