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SURFACE TEMPERATURE FIELD MODEL AND INFLUENCE FACTORS OF HF CVD DIAMOND FILMS ON WCCo ALLOYS

    https://doi.org/10.1142/S0218625X06008621Cited by:0 (Source: Crossref)

    The surface temperature field model of hot filament chemical vapor deposition (HF CVD) diamond films on WCCo alloys was constructed and calculated by taking into account the influences of both thermal source properties and physical properties of substrates. Under the certain conditions of some parameters, the effects of the influence factors such as the maximum specific heat flux (qm), the heat conductivity coefficient (λ) of the substrate and the substrate height (h) on the surface temperature field were exhibited quickly and clearly by the computer modeling. The theoretical calculating data are close to the experimental results. It is found that the influences of the thermal source parameter, the substrate height, and the heat conductivity coefficient of the substrate materials on the surface temperature field of diamond films on WCCo alloys are almost equally important.