Processing math: 100%
Skip main navigation

Cookies Notification

We use cookies on this site to enhance your user experience. By continuing to browse the site, you consent to the use of our cookies. Learn More
×

System Upgrade on Tue, May 28th, 2024 at 2am (EDT)

Existing users will be able to log into the site and access content. However, E-commerce and registration of new users may not be available for up to 12 hours.
For online purchase, please visit us again. Contact us at customercare@wspc.com for any enquiries.

SEARCH GUIDE  Download Search Tip PDF File

  • articleNo Access

    Comparative study on the second-harmonic generation of thermally poled fused silica by multi-energy boron and argon ion implantations

    The second-order optical nonlinearity (SON) of thermally poled fused silica was shown for the first time to be significantly improved by the implantation of multi-energy boron (B) ions, and the outcomes were compared with those obtained from the implantation of multi-energy argon (Ar) ions. Second-harmonic (SH) signals in both samples grew roughly linearly as the poling temperature rose. Samples with Ar implants showed a greater increase in SH signal with rising poling temperature. A qualitative explanation for the formation of χ(2) in poled samples can be found in a model of charge hopping and migration through defects. The diminished SH signal in the B-implanted sample is probably caused by the negative charge trapping layer, as well as by B2α and E center defects.