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Ag thin films deposited on Ru (0001) surface by molecular beam epitaxy, at temperatures of 20°C and 450°C, have been investigated using reflection high-energy electron diffraction (RHEED), atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques. For both growth temperatures, the in situ RHEED patterns of the Ag films exhibited an in-plane six-fold symmetry, indicating that the Ag deposit is in epitaxy with the Ru buffer surface. At RT, the RHEED technique indicated a three-dimensional growth (3D), while a layer-by-layer growth (2D) takes place at HT. The AFM images showed a granular structure of the surface of the deposited Ag layers with a large variation of the roughness with the growth temperature. XRD analysis gave indication of a strongly textured thin film along the growth direction. The lattice mismatch between the Ag and Ru is at the origin of a stress at the interface and defects structure in the film.

Chlorine is one of the most used species to produce n-type ZnSe epilayers. In this paper, we present Secondary Ion Mass Spectrometry (SIMS) profiles of a series of Cl-doped ZnSe samples, which were grown by Molecular Beam Epitaxy (MBE) technique on GaAs substrates. These profiles have been used to examine the limitation of SIMS analysis of narrow Cl-delta layers. In order to convert SIMS raw data to quantified data, the depth profile from a Cl-implanted standard sample has been used to estimate the "useful ion yield" of chlorine and thus the instrumental sensitivity for chlorine in a ZnSe matrix. The "useful ion yield" and detection limit of chlorine in the ZnSe host matrix were calculated to be 4.7 × 10^-7 and 5 × 10¹⁷ atoms/cm³, respectively.

We have investigated the effect of Bi on the heteroepitaxial growth of Co on Cu by reflection high-energy electron diffraction (RHEED) measurements. It was found that Bi enhanced the layer-by-layer growth of Co on the Cu(111) surfaces at 100°C. The dependence of the growth on Bi layer thickness suggested that there existed a suitable amount of Bi surfactant layer that enhanced smoother layered growth. On the contrary, for the case of Co growth on Cu(100), Bi depressed the layer-by-layer growth of Co on Cu(100). The surface segregation effect of Bi was also studied by Auger electron spectroscopy (AES).

This article reports the use of plasma-assisted molecular beam epitaxy (MBE) to grow AlN on Si(111) substrate at 850°C under UHV conditions for 15, 30, and 45 min. The films were characterized by high-resolution X-ray diffraction (HR-XRD) and micro-Raman spectroscopy. XRD measurement revealed that the AlN was epitaxially grown on Si(111). Micro-Raman result showed that all the allowed Raman modes of AlN and Si were clearly visible. Fourier transform infrared (FTIR) spectroscopy has been used to investigate the A₁ (LO) and E₁ (TO) modes with frequencies (890–899) cm^-1 and (668–688) cm^-1, respectively. The results are in good agreement with reported phonon frequencies of AlN grown on Si(111).