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Electromagnetic metamaterials are a new class of ordered composite materials made from metallic unit structures that exhibit an electric and magnetic response to an incident electromagnetic wavefield such that ∊ and μ become simultaneously negative. We review the recent progress made in manufacturing and characterizing micro- and nanostructured metamaterials from 1 to 216 THz (300 to 1.4 μm, respectively), at the Singapore Synchrotron Light Source, and discuss new developments towards three-dimensional and multilayered metamaterials structures by means of deep X-ray lithography.