The context of SOI technology is briefly presented in terms of wafer fabrication, configuration/performance of SOI devices, and operation mechanisms in partially and fully depleted MOSFETs. Typical radiation effects, induced by single particles and cumulated dose, are evoked: BOX degradation, parasitic bipolar action, coupling effects, transistor latch, and back-channel conduction. The future of SOI is tentatively explored, by discussing the further scalability of SOI-MOSFETs as well as the innovating architectures proposed for the ultimate generations of SOI transistors.