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PLASMA DEPOSITION OF FLUOROPOLYMER FILMS IN DIFFERENT GLOW DISCHARGE REGIMES

    https://doi.org/10.1142/9781860945380_0002Cited by:8 (Source: Crossref)
    Abstract:

    The following sections are included:

    • Introduction

    • On the Jargon of PE-CVD Processes

    • Continuous, Afterglow and Modulated PE-CVD

      • Fluorocarbon Monomers

    • Diagnostic Techniques for PE-CVD Processes of Fluoropolymers

      • Surface and Bulk Analysis

      • Plasma Diagnostic Techniques

    • Active Species in Fluorocarbon Plasmas

      • Additives to Drive the F/CFx Density Ratio of a Fluorocarbon Discharge

    • Relevant Parameters in PE-CVD Processes of Fluoropolymers

      • Ion Bombardment and Substrate Temperature

      • Power, Flow Rate, Pressure and Combined Parameters

      • Distance of the Substrate from the Glow

      • Duty Cycle and Period in Modulated Plasmas

    • The Activated Growth Model

    • Applications of Plasma-Deposited Fluoropolymers

      • Wettability of Fluorocarbon Coatings and Applications for Textiles and Paper

      • Biomedical Applications Proposed for Plasma-Deposited Fluoropolymers

    • Conclusive Remarks

    • Acknowledgements

    • References