Quantum Dot Channel (QDC) Field Effect Transistors (FETs) Configured as Floating Gate Nonvolatile Memories (NVMs)

This paper presents quantum dot channel (QDC) Field Effect Transistors (FETs) which are configured as nonvolatile memories (NVMs) by incorporating cladded GeO_x-Ge quantum dots in the floating gates as well as the transport channels. The current flow and the threshold characteristics were significantly improved when the gate dielectric was changed from silicon dioxide (SiO₂) to hafnium aluminum oxide (HfAlO₂), and the control dielectric was changed from silicon nitride (Si₃N₄) to hafnium aluminum oxide (HfAlO₂). The device operations are explained by carrier transport in narrow energy mini-bands which are manifested in a quantum dot transport channel.