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PIXE ANALYSIS OF DRY DEPOSITION COLLECTED BY A CONTINUOUS SAMPLER USING A MODIFIED BETA-ATTENUATION DUST MONITOR

Precision Analysis Group, Research and Development Division, Radiation Laboratory, Tokyo Metropolitan Industrial Technology Research Institute, 2-11-1 Fukazawa Setagaya-ku Tokyo 158-0081, Japan

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HIROAKI ISE

Precision Analysis Group, Research and Development Division, Radiation Laboratory, Tokyo Metropolitan Industrial Technology Research Institute, 2-11-1 Fukazawa Setagaya-ku Tokyo 158-0081, Japan

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https://doi.org/10.1142/S012908359700028XCited by:1 (Source: Crossref)

Abstract

A high time-resolution system for dry deposition measurement was developed. This employed a modified beta-attenuation dust monitor and PIXE analysis in order to characterize the process of dry deposition. It was demonstrated that PIXE analysis can detect the presence of Al, Si, S and Fe in dry deposition samples for a one-hour sampling time.

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References

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