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articleNo Access
PIXE ANALYSIS OF DRY DEPOSITION COLLECTED BY A CONTINUOUS SAMPLER USING A MODIFIED BETA-ATTENUATION DUST MONITOR
- MASARU NAKAMURA and
- HIROAKI ISE
International Journal of PIXE01 Jan 1997
Preview Abstract
A high time-resolution system for dry deposition measurement was developed. This employed a modified beta-attenuation dust monitor and PIXE analysis in order to characterize the process of dry deposition. It was demonstrated that PIXE analysis can detect the presence of Al, Si, S and Fe in dry deposition samples for a one-hour sampling time.

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