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Fabrication and Characterization of Four-State Inverter Utilizing Quantum Dot Gate Field-Effect Transistors (QDGFETS)

    https://doi.org/10.1142/S0129156424400706Cited by:0 (Source: Crossref)
    This article is part of the issue:

    This paper presents the experimental results of nMOS quantum dot gate field-effect transistor (QDG-FET) based four-state inverter fabricated and tested with Si/SiO2 and Ge/GeO2 quantum dots. The site-specific self-assembly of SiOx-cladded Si and GeOx-cladded Ge quantum dot layers in the gate region implements both the driver and load FETs in enhancement nMOS inverters. A four-state inverter will allow the reduction of FET count in logic block in microprocessors.

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