Loading [MathJax]/jax/output/CommonHTML/jax.js
World Scientific
Skip main navigation

Cookies Notification

We use cookies on this site to enhance your user experience. By continuing to browse the site, you consent to the use of our cookies. Learn More
×

System Upgrade on Tue, May 28th, 2024 at 2am (EDT)

Existing users will be able to log into the site and access content. However, E-commerce and registration of new users may not be available for up to 12 hours.
For online purchase, please visit us again. Contact us at customercare@wspc.com for any enquiries.

SYSTEMATIC EXPLORATION OF THE EFFECTS OF CR-DOPING ON MICROSTRUCTURE, INSULATING, AND FERROELECTRIC PROPERTIES OF BiFeO3 THIN FILM

    https://doi.org/10.1142/S0218625X18501664Cited by:7 (Source: Crossref)

    BiFe1xCrxO3 (xBFCO, x=0.01, 0.02, 0.03, 0.04, 0.05) thin films were successfully fabricated onto Pt(111)/TiO2/SiO2/Si substrate via a solgel process. The correlation between microstructure and insulating, ferroelectric properties of xBFCO thin films are investigated. The leakage behavior for all the thin films is in accordance with the Ohmic conduction and FN Tunneling emission during low and high electric field region, respectively. Compared with the pure BFO, all the thin films with Cr3+ doping possess reduced leakage current density by 1–2 orders of magnitude, with the lowest value approximately 104 at 200kV/cm. Moreover, the 0.04BFCO thin film exhibits the maximum remanent polarization (Pr) value of 29.8μC/cm2 with a great fatigue behavior, which could be ascribed to the absence of impurity phase and reduced leakage current.