SYSTEMATIC EXPLORATION OF THE EFFECTS OF CR-DOPING ON MICROSTRUCTURE, INSULATING, AND FERROELECTRIC PROPERTIES OF BiFeO3 THIN FILM
Abstract
BiFe1−xCrxO3 (xBFCO, x=0.01, 0.02, 0.03, 0.04, 0.05) thin films were successfully fabricated onto Pt(111)/TiO2/SiO2/Si substrate via a solgel process. The correlation between microstructure and insulating, ferroelectric properties of xBFCO thin films are investigated. The leakage behavior for all the thin films is in accordance with the Ohmic conduction and FN Tunneling emission during low and high electric field region, respectively. Compared with the pure BFO, all the thin films with Cr3+ doping possess reduced leakage current density by 1–2 orders of magnitude, with the lowest value approximately 10−4 at 200kV/cm. Moreover, the 0.04BFCO thin film exhibits the maximum remanent polarization (Pr) value of 29.8μC/cm2 with a great fatigue behavior, which could be ascribed to the absence of impurity phase and reduced leakage current.