Improvement of the energy stability of the Tohoku Dynamitron accelerator for microbeam and nanobeam applications
Abstract
The microbeam system at Tohoku University has various applications. Recently higher spatial resolution down to several hundred nm and higher beam current with the resolution of several μm were required. To meet these requirements, a triplet lens system was installed. While the triplet system has higher demagnification, the chromatic aberration is much larger than in the doublet system. To achieve better performance in the triplet system, improvements in the energy resolution of the accelerator are required. Various sources of accelerator voltage ripples were investigated. The high voltage generating circuit was symmetrized and the noise components were reduced to minimize the voltage ripple. The voltage ripple of the accelerator for low-frequency components was reduced to around 70 V. The voltage ripple of the 120-kHz component was 140 Vp-p.
