This paper investigates the conditions for ductile-regime machining of (100) silicon wafers. Single crystalline diamond tools with 10-40 nm edge sharpness were used to machine the wafer at either a constant depth of cut, or in a taper mode to vary the depth of cut up to 1 µm. Feedrate was varied as a percentage of tool nose radius and the machining process was performed on an ultraprecision machining system. The surface and subsurface integrity were then characterized by atomic force microscopy, phase shift interferometry, and ion beam micromilling.
Ductile regime was achieved when machining along the <110> directions and the maximum chip thickness of less than 0.5 µm. Machining conditions that formed thicker chips lead to pitting, microcracks and slip lines. Such defects, could be more than 1 µm deep, were found along the <110> directions and occasionally along the <100> directions. Surface roughness below 10 nm was measured in a ductile regime area, but was as high as 170 nm in a fractured area. When cutting at a depth of cut in the magnitude of the tool edge sharpness, the surface finish was degraded due to radial cracks in the lateral plane due to rubbing between the tool and the workpiece.