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  • articleNo Access

    Ray Tracing of Aluminum Nitride as Anti-Reflective Coating on Silicon for Photovoltaic Devices

    Nano13 Jan 2025

    III-nitride materials have attracted wide interests for optoelectronic and electronic applications due to their unique and tunable semiconducting and optical properties. Aluminum nitride (AlN) exhibits an ultra-wide bandgap of 6.2eV and wide transparency window from ultraviolet to mid-infrared, making it a promising candidate as an anti-reflective coating (ARC) material on silicon for photovoltaic (PV) devices. In this work, ray tracing is utilized to investigate the optical properties of AlN ARC on 150μm-thick c-Si absorber. AlN with thicknesses of 60–90nm are studied and the effects towards light absorption (within 300–1200nm wavelength region) and short-circuit current density (JSC) of the solar cell are analyzed. In the ray tracing, planar c-Si absorber without an ARC is used as a reference. The reference condition exhibits weighted average reflection (WAR) of 39.8% within the 300–1200nm wavelength region with JSC of 25.49mA/cm2. AlN with 80nm is found to be the optimum ARC thickness, which leads to the enhanced broadband absorption with WAR of 19.7% within the spectral region. This thickness represents the highest JSC achieved in this work (35.71mA/cm2).

  • articleNo Access

    Investigation of Gallium Nitride Emitter Thickness in GaN/Si Heterojunction Solar Cell by SCAPS-1D

    Nano11 Feb 2025

    III-nitride materials have attracted wide interests for optoelectronic and electronic applications due to their unique and tuneable semiconducting and optical properties. Gallium nitride (GaN) exhibits wide bandgap of 3.42eV, high thermal and chemical stability, with a strong potential to act as an electron selective contact (i.e., emitter) in GaN/Si heterojunction solar cells. However, despite all the advantages, to date, there is no published research that has which utilized GaN as an emitter in the GaN/Si heterojunction solar cells. In this work, SCAPS-1D simulation is utilized to investigate the electrical properties of GaN emitter on 150μm-thick monocrystalline silicon (mono c-Si) absorber layer in GaN/Si heterojunction solar cell architecture. GaN emitter with the thickness of 30–120nm are studied and the effects toward open-circuit voltage (VOC), short-circuit current density (JSC), fill factor (FF), power conversion efficiency (PCE) and external quantum efficiency (EQE) of the solar cell are analyzed. The optimum thickness of the GaN emitter is found to be 60nm with JSC of 37.53mA/cm2, VOC of 628.73mV and PCE of 19.43%. The findings show the potential of the GaN/Si heterojunction solar cell for the future of the PV industry, especially for applications in harsh and extreme conditions.