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Atomic force microscopy (AFM) was originally developed for atomic resolution surface topography observations. Nowadays, it is also widely used for nanolithography. AFM-based lithography is an effective method compared to conventional photolithographic processes due to its simplicity, high resolution, and low cost. It can provide nanoscale stage control and the probing tip can be used as a lithographic tool. Therefore, various AFM-based nanoscale fabrication methods have been proposed using electrochemical oxidation, material transfer, mechanical lithography, and thermally induced modifications. This chapter will introduce the detailed processes and applications of AFM-based lithographic techniques.