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Direct current accelerators form the basis of many front-line industrial processes. They have many advantages that have kept them at the forefront of technology for many decades, such as a small and easily managed environmental footprint. In this article, the basic principles of the different subsystems (ion and electron sources, high voltage generation, control, etc.) are overviewed. Some well-known (ion implantation and polymer processing) and lesser-known (electron beam lithography and particle-induced X-ray aerosol mapping) applications are reviewed.

Assuming a magnetic field perpendicular to ion extraction axis x, a selfconsistent model of the plasma and of the ion beam, including all the structures in-between (presheath, sheath and meniscus), is written and numerically solved in two dimension x, y. A series expansion of the one dimensional solution is used to represent most of the plasma analytically and to precise boundary conditions. Five field variables are used to treat the positive ion case, namely the three fluid velocities V, the ion density profile n and the adimensional potential u. Collisional effect and their implication on equation kind and stability are discussed, as well as correction to fluid approximation.

Direct current accelerators form the basis of many front-line industrial processes. They have many advantages that have kept them at the forefront of technology for many decades, such as a small and easily managed environmental footprint. In this article, the basic principles of the different subsystems (ion and electron sources, high voltage generation, control, etc.) are overviewed. Some well-known (ion implantation and polymer processing) and lesser-known (electron beam lithography and particle-induced X-ray aerosol mapping) applications are reviewed.