Nanoelectromechanical systems (NEMS) are commonly realized in the form of simple movable suspended nanostructures, such as doubly-clamped beams, cantilevered beams or torsion pedals. NEMS come with extremely high fundamental resonance frequencies, diminished effective masses, low spring constants and high in vacuo quality (Q) factors. As such, these structures have received much recent attention for their potential technological applications as well as for realizing a mesoscopic quantum harmonic oscillator.
This chapter presents a review of the variety of approaches for fabricating NEMS devices. The mainstay approach for patterning freely suspended nanostructures is nanomachining based upon electron beam lithography (EBL). This approach has been applied to fabricate silicon, gallium arsenide, silicon carbide, aluminum nitride, diamond and silicon nitride NEMS; variations of EBL based nanomachining have also been used to fabricate nanotube and nanowire NEMS. Among other emerging approaches reviewed herein are approaches based upon nanoimprint lithography, focused ion beams and stencil masks. Important remaining research issues in the field, such as large scale integration of NEMS, are discussed along with concluding remarks.