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TiO₂ films were deposited from oxygen/titanium tetraisopropoxide (TTIP) plasmas at low temperature by Helicon-PECVD at floating potential ($V_f)$ or substrate self-bias of $-$50V. The influence of titanium precursor partial pressure on the morphology, nanostructure and optical properties was investigated. Low titanium partial pressure ([TTIP] $<$ 0.013Pa) was applied by controlling the TTIP flow rate which is introduced by its own vapor pressure, whereas higher titanium partial pressure was formed through increasing the flow rate by using a carrier gas (CG). Then the precursor partial pressures [TTIP$+$CG] $=0.027$Pa and 0.093Pa were obtained. At $V_f$, all the films exhibit a columnar structure, but the degree of inhomogeneity is decreased with the precursor partial pressure. Phase transformation from anatase ([TTIP] $<$ 0.013Pa) to amorphous ([TTIP$+$CG] $=0.093$Pa) has been evidenced since the O${}_2^{+}$ ion to neutral flux ratio in the plasma was decreased and more carbon contained in the film. However, in the case of $-$50V, the related growth rate for different precursor partial pressures is slightly ($\sim$ 15%) decreased. The columnar morphology at [TTIP] $<$ 0.013Pa has been changed into a granular structure, but still homogeneous columns are observed for [TTIP$+$CG] $=0.027$Pa and 0.093Pa. Rutile phase has been generated at [TTIP] $<0.013$Pa. Ellipsometry measurements were performed on the films deposited at $-$50V; results show that the precursor addition from low to high levels leads to a decrease in refractive index.

The cold plasma technique, developed especially in recent years, opens the door to new materials with unique properties. This is related both to the plasma deposited thin films, which constitute integrally new materials, and to the plasma surface treatments, which drastically change the surface properties of conventional materials. Looking for novel solutions for innovative energy systems, it has been found that the both types of plasma activity are very useful for this purpose. The objective of this paper is to demonstrate the possibilities of the cold plasma technique for preparation of new materials for energy systems. A few examples of recent studies on such materials are presented. A special attention is focused on plasma deposited optoelectronically active thin films for solar cells, nanocatalytic thin films for fuel cells and plasma treated carbon electrodes for supercapacitors. These examples confirm the important role of the cold plasma technique in the development of modern and advanced energy systems.

Microstructure and properties of the deposited layer in 45 # steel surface by Plasma surfacing was studied on the effection of three parameters, including deposition rate, deposition current, powder feed rate. Metallurgical analysis showed that the deposited layer organization changed uniform and small with the deposition rate and the deposition current increasing. When the powder feeding rate was 75g / min, organization was small and its cured (CrFe)7C3 was distribution. Deposit was distributed in hardness gradient, and wear resistance increased significantly.

Since the support material should be contacted with the supporting surface of the molding materials, so supporting materials must be able to withstand the high temperatures of the molding material and no decomposition and melting, with a smaller gas evolution. The support material also needs a high compressive strength to be able to support the molten metal product. This paper compares gas forming property of phosphate, sodium silicate and furan resin. The results show that phosphate is the smallest of gas evolution. At the same time, discuss the Impact of citric acid, firming agent and binder addition on compressive strength. Found that the support material made by Phosphate Binder can meet the technical requirements.