III-Nitride heterostructure field-effect transistors (HFETs) demonstrated a new paradigm in microwave switching and control applications due to unique combination of extremely low channel resistance (leading to low loss), very high RF power, low off-state capacitance, broad range of operating temperatures, chemical inertness and robustness. The paper reviews novel approaches and recent advances in III-Nitride technology for RF switching devices leading to higher operating frequencies and even lower insertion loss.

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