Narrow Results

Bi₂FeCrO₆ thin films were epitaxially grown by pulsed laser deposition on (100)-oriented LaAlO₃, (LaAlO₃)_0.3(Sr₂LaTaO₆)_0.7 and SrTiO₃ single crystalline substrates with and without epitaxial CaRuO₃ buffered layer. The in-plane compressive strain induces monoclinic distortion of the Bi₂FeCrO₆ lattice cell. The strain originates from lattice mismatch between CaRuO₃ and single crystal substrates. The similar crystal structure of the substrate and the layer lead to coherent epitaxial growth of the heterostructures and avoid strain relaxation in particular for BFCO films deposited on LaAlO₃ substrates. The ferroelectric character is demonstrated for all grown BFCO films. The residual in-plane strain weakly affects the effective piezoelectric coefficient of BFCO layers.

Ability of epitaxial perovskite oxide ferroelectric films to maintain a poled polarization state on a long-term scale is crucial for advanced devices employing such films. Here polarization relaxation with time, or aging, is experimentally studied in epitaxial capacitor heterostructures of PbTiO₃ sandwiched between SrRuO₃ and Pt electrodes. The relaxation obeys logarithmic time-decay for the time 10²–10⁵s after poling pulses. The decay is by factor $\sim$10 slower than that reported for polycrystalline films. Our experimental results show that existing models are insufficient for epitaxial films.

The cubic polymorph of the binary transition metal pnictide (TMP) MnSb, c-MnSb, has been predicted to be a robust half-metallic ferromagnetic (HMF) material with minority spin gap ≳1 eV. Here, MnSb epilayers are grown by molecular beam epitaxy (MBE) on GaAs and In_0.5Ga_0.5As(111) substrates and analyzed using synchrotron radiation X-ray diffraction. We find polymorphic growth of MnSb on both substrates, where c-MnSb co-exists with the ordinary niccolite n-MnSb polymorph. The grain size of the c-MnSb is of the order of tens of nanometer on both substrates and its appearance during MBE growth is independent of the very different epitaxial strain from the GaAs (3.1%) and In_0.5Ga_0.5As (0.31%) substrates.