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CHARACTERISTICS OF DLC FILMS INCORPORATED HMDS BY RF PECVD
Preview AbstractSilicon incorporated diamond-like carbon films up to 6.2 at. % (DLC-Si) were deposited onto a high speed steel samples by using a radio frequency plasma-enhanced chemical vapor deposition method. The influence of silicon doping on chemical composition, bonding structure, hardness, and adhesion of DLC films was investigated. Hexamethyldisilane (HMDS) gas was used as a silicon source with Ar carrier gas ranging from 0 to 15 sccm. Also, the mixtures of methane (CH4) and Ar gases were used as precursor gases. The addition of silicon into the DLC film was found to lead an increase of bonding ratio (sp3/sp2), hardness and critical adhesion