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Trapping of hot electron behavior by trap centers located in the buffer layer of a wurtzite phase GaN MESFET has been simulated using an ensemble Monte Carlo simulation. The simulated results show that trap centers are responsible for current collapse in GaN MESFET at low temperatures. These electrical traps degrade the performance of the device at low temperatures. On the other hand, at high temperatures, the electrical performances are improved due to electron emission from the trap centers. The simulated device geometries and doping are matched to the nominal parameters described for the experimental structures as closely as possible, and the predicted drain current and other electrical characteristics for the simulated device including the trapping center effects show much closer agreement with the available experimental data than without trap center effects.
Zn2GeO4:Mn2+,Eu3+ and Zn2GeO4:Mn2+ powders were synthesized by a high-temperature solid-state reaction. X-ray powder diffraction (XRD) and scanning electron microscopy (SEM) were used to characterize the structures and morphologies of the synthesized powders, respectively. The photocatalytic properties and long persistent luminescence performance were improved by Eu3+ doping. Thermoluminescent (TL) curves showed that the trap concentration in the material was increased with Eu3+ doping, which formed trap centers in Zn2GeO4:Mn2+. The trap centers can capture the electrons or holes and subsequently increase the separation of photogenerated electrons and holes by suppressing the recombination of captured electrons and holes; thus, resulting in an improved photocatalytic activity and a prolonged persistent luminescence. The present strategy may be used as a general method to improve the photocatalytic activity and persistent luminescence.